MoS2 Film

Specifications:

• Grown by chemical vapor deposition techniques.
• 100% coverage of growth substrate.
• High uniformity: Precise control of layer number with no mixture of layers.
• Atomically-smooth surface (< 0.2 nm).
• High crystalline quality: Raman and PL intensity comparable to single-crystalline flakes.
• Polycrystalline with grain sizes in the micrometer range.
• Raman intensity variation < 10% across entire product.
• Prices are for standard 1 cm x 1 cm substrates
• Standard substrates are SiO2/Si with 90 nm or 300 nm thermally grown oxide or single-side polished sapphire (others substrates available upon request)