4 inch 2D TMDC Film Wafer

Specifications:

• Grown by chemical vapor deposition techniques.
• Material options: MoS2, WS2, MoSe2, and WSe2
• 100% coverage of growth substrate
• Precise control of layer number with no mixture of layers
• High crystalline quality; Raman and PL intensity comparable to single-crystalline flakes
• Atomically-smooth surface (< 0.2 nm)
• Perfect Uniformity, Raman intensity variation <10% across the entire substrate
• Polycrystalline film with grain sizes in micrometer range
• Standard substrate options (others available upon request):
  • SiO2/Si w/300 nm or 90 nm dry thermal oxide
  • Single-side polished sapphire