As-Grown TMDC Heterostructure Wafer

Specifications:

• Expected to be fully available by December 2020. Now accept pre-ordering…
• Material options: Two-layer heterostructures (MoS2/WS2, WS2/MoS2) and three-layer heterostructures (WS2/MoS2/WS2, MoS2/WS2/MoS2).
• 100% coverage of growth substrate
• Precise control of layer number with no mixture of layers
• High crystalline quality; Raman and PL intensity comparable to single-crystalline flakes
• Atomically-smooth surface (< 0.2 nm)
• Perfect Uniformity, Raman intensity variation <10% across the entire substrate
• Polycrystalline film with grain sizes in micrometer range
• Standard substrate options (others available upon request):
  • SiO2/Si w/300 nm or 90 nm dry thermal oxide
  • Single-side polished sapphire