8 inch 2D TMDC Film Wafer


  • Expected to be fully available by March 2021. Now accept pre-ordering…
  • Grown by chemical vapor deposition techniques.
  • Material options: MoS2, WS2, MoSe2, and WSe2
  • 100% coverage of growth substrate
  • Precise control of layer number with no mixture of layers
  • High crystalline quality; Raman and PL intensity comparable to single-crystalline flakes
  • Atomically-smooth surface (< 0.2 nm)
  • Perfect Uniformity, Raman intensity variation <10% across the entire substrate
  • Polycrystalline film with grain sizes in micrometer range
  • Standard substrate options (others available upon request):
    • SiO2/Si w/300 nm or 90 nm dry thermal oxide
    • Single-side polished sapphire

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