As-Grown TMDC Heterostructure Wafer
Specifications:
- Expected to be fully available by December 2020. Now accept pre-ordering…
- Material options: Two-layer heterostructures (MoS2/WS2, WS2/MoS2) and three-layer heterostructures (WS2/MoS2/WS2, MoS2/WS2/MoS2).
- 100% coverage of growth substrate
- Precise control of layer number with no mixture of layers
- High crystalline quality; Raman and PL intensity comparable to single-crystalline flakes
- Atomically-smooth surface (< 0.2 nm)
- Perfect Uniformity, Raman intensity variation <10% across the entire substrate
- Polycrystalline film with grain sizes in micrometer range
- Standard substrate options (others available upon request):
- SiO2/Si w/300 nm or 90 nm dry thermal oxide
- Single-side polished sapphire
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