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Monolayer MoS2 Film on Sapphire Substrates

$449.00

Specifications

1. Continuous, no voids and cracks, 100% coverage.

2. Size: 1 x1 cm. Larger sizes up to 2-inch wafer-scale available upon requests.

3. Atomically smooth surface with roughness < 0.2 nm.

4. Highly uniform, no mixture of other layers.  Raman intensity variation < 10% across the entire sample.

5. High crystalline quality, Raman intensity and PL efficiency comparable to single crystalline monolayer flakes.

6. Polycrystalline, grain size tuned in the range of from tens of nm to micrometers.

7. Substrate:  single-side  polished C plane sapphire.  Option of double-side polished sapphire available upon request.

Product Description

Continuous 2D transition metal dichalcogenide (TMDC) films may provide research opportunities that are difficult or cannot be obtained with small-scale flakes. They are grown on substrates using chemical vapor deposition processes.

The films are continuous, fully covering the substrate with no void and cracks.  The growth substrates usually are sapphire or SiO2/Si substrates, but the films can be transferred onto arbitrary substrates  without compromising quality.

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The films have high crystalline quality.  They are polycrystalline with grain size tunable from tens of nanometers to micrometers.

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The monolayer film may have photoluminescence efficiency comparable to single-crystalline monolayer flakes.

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The films are highly uniform with no mixture of other layers.  The surface of monolayer films has a roughness of around 0.2 nm.

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The frequency difference of the characteristic Raman peaks in the monolayer film , 19.8 cm-1, is similar to what observed at single crystalline monolayer MoS2 flakes.  And  the variation of Raman intensities across the entire sample is less than 10%, which further indicates the remarkable uniformity of the film.

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Except the Raman measurement, the composition of the film can also be confirmed to be MoS2 by XPS measurement.

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Please inquire to info@2dlayer.con for more technical specifications.